Features of the Oxidation of Multilayer (TiAlCrSiY)N/(TiAlCr)N Nanolaminated PVD Coating during Temperature Annealing

A nano-multilayer Ti0.2Al0.55Cr0.2Si0.03Y0.02N/Ti0.25Al0.65Cr0.1N PVD coating was deposited on Kennametal carbide K 313 inserts. These coatings are widely used to protect cutting tools under severe exploitation conditions. Under equilibrium conditions, it found that the Al2O3 oxide possessed better adhesive properties than TiO2. The addition of chromium further enhanced oxidation resistance coatings. Silicon significantly increased this type coating. diffusion process in have not been sufficiently investigated, despite considerable number articles published topic. For purpose study, a multilayer ion-plasma (TiAlCrSiY)N/(TiAlCr)N oxidized conditions; its chemical inhomogeneity studied by time-of-flight mass spectroscopy using TOF SIMS5-100 instrument. data collected from an area 100 × µ. D-300 profilometer (KLA-Tencor Corp., Milpitas, California 95035, USA) determine rate ion etching. It commenced at surface nanolayer TiAlCrN nitride, forming loose films Cr2O3, TiO2, and oxides. This passivating film had thickness around 140 nm. first time, interlayer coefficients Si Y were determined based Ti0.2Al0.55Cr0.2Si0.03Y0.02N/Ti0.25Al0.65Cr0.1N, open air annealing 700 °C. physical nature differences these elements is discussed. near-surface volumes lower deep layers coating, most likely due formation surface.